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化学工学会 第82年会 (東京 2017)

Last modified: 2017-02-20 10:00:00

講演プログラム（セッション別） : K-2

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K-2 [国際シンポジウム]
 CVDの反応工学：iCVDなどの新プロセス、応用展開と基礎的理解

オーガナイザー：町田　英明（気相成長(株)）・ 百瀬　健（東京大学）・ 野田　優（早稲田大学）

アジア国際賞を受賞された韓国KAISTのSung Gap Im先生をお招きし、iCVD (initiated chemical vapor deposition)法による高分子極薄膜の低温・均一製膜と、エレクトロニクス・生体医療などへの新展開をご講演頂きます。また、CVDプロセスの反応工学的解析と、その理解に基づいた合理的なプロセスの設計と開発、更には先端材料・デバイスへの展開を議論します。

E 会場 ・ 第 2 日

講演
時刻		講演
番号		講演題目／発表者キーワード分類
番号		受理
番号
E 会場(教室棟 4階 404) ・ 第 2 日(3月7日(火))
(9:00～12:00) (Chair: Noda Suguru)
9:00～ 9:40E201[Invited lecture] Analysis and Design of CVD/ALD processes Based on Chemical Reaction Engineering
(U. Tokyo) (Ful)Shimogaki Yukihiro
Chemical Reaction Engineering
CVD
Process Design
K-2838
9:40～ 10:20E203[Invited lecture] Cat-CVD and Its Development to Various Fields
(JAIST) Matsumura Hideki
Thin Film Technology
Cat-CVD
Cat-doping
K-282
10:20～ 10:40E205[Requested talk] Reaction Mechanism and Growth-rate Distribution in Metal-Organic Vapor-Phase Epitaxy of GaN
(U. Tokyo) *(Ful)Sugiyama Masakazu, (Ful)Momose Takeshi, (Politecnico Di Milano) Ravasio Stefano, Cavallotti Carlo, (U. Tokyo) (Ful)Shimogaki Yukihiro
GaN
MOVPE
reaction mechanism
K-2324
10:40～ 11:00E206[Requested talk] Plasma decomposition of hexamethyldisiloxane, oxygen, and ammonia for coating a polymer substrate with silica-based film
(Kyoto U.) (Ful)Kawase M.
Plasma CVD
silica-based gas-barrier film
HMDSO
K-2740
11:00～ 11:20E207[Requested talk] B-atom release from metal wires boronized by non-explosive boron compounds
(Shizuoka U.) Umemoto Hironobu
chemical vapor deposition
hot wire
boron atoms
K-217
11:20～ 11:40E208[Requested talk] Surface reaction design for silicon epitaxial growth based on the reactor simulation
(Yokohama Nat. U.) *(Ful)Habuka Hitoshi, Watanabe Toru, Yamada Ayami, Saito Ayumi, Sakurai Ayumi
silicon epitaxial growth rate
trichlorosilane
silicon hydride
K-214
11:40～ 12:00E209[Requested talk] CVD and ALD precursor candidates for transition metal film deposition
(Gas-Phase Growth) Machida Hideaki
Transition metal film
Amidinate precursor
Ethyl derivatives
K-2157
(13:00～15:20) (Chair: Momose Takeshi)
13:00～ 13:40E213[The SCEJ Award for Outstanding Asian Researcher and Engineer] Vapor-phase deposition of functional polymer films and their applications
(KAIST) Im Sung Gap
initiated chemical vapor deposition
functional polymer films
electronic, separation, and biomedical applications
K-226
13:40～ 14:20E215[Invited lecture] Application of Cat-CVD technology to crystalline silicon solar cells
(JAIST) *Ohdaira Keisuke, Trinh Cham Thi, Oikawa Takafumi, Seto Junichi, Koyama Koichi, Matsumura Hideki
catalytic chemical vapor deposition
crystalline Si solar cell
passivation
K-285
14:20～ 14:40E217[Requested talk] Synthesis of carbon nitride using microwave plasma CVD
(Gifu U.) *Tanaka Ippei, (Chiba Inst. Tech.) Sakamoto Yukihiro
plasma
CVD
carbon nitride
K-2477
14:40～ 15:00E218[Requested talk] PEALD-TiO2 films synthesized via CCRF discharges
(Tokyo Electron Yamanashi) Iwashita Shinya
TiO2
PEALD
deposition
K-2217
15:00～ 15:20E219[Requested talk] Surface coating of carbon nanotubes by aerosol process with plasma enhanced chemical vapor deposition
(Hiroshima U.) *(Ful)Shimada Manabu, (Ful)Kubo Masaru, (Hiroshima U./ITS Surabaya) (Ful)Kusdianto K.
PECVD
carbon nanotube
dry coating process
K-2396
(15:40～17:20) (Chair: Machida Hideaki)
15:40～ 16:00E221[Requested talk] Novel catalytic property of structured catalyst prepared by wet-type chemical deposition
(Shizuoka U.) (Ful)Fukuhara Choji
Electroless plating
Structured catalyst
Hydrogen production
K-2198
16:00～ 16:20E222[Requested talk] Thin film deposition in supercritical fluids - impact of solvent capability on deposition characteristics
(U. Yamanashi) (Ful)Kondoh Eiichi
supercritical fluids
solvent capability
thin film deposition
K-2184
16:20～ 16:40E223[Requested talk] Hot-filament CVD growth of low-resistivity diamond for power device applications
(AIST) Ohmagari Shinya
hot-filament CVD
diamond
low-resistivity
K-2219
16:40～ 17:00E224[Requested talk] Effects of N2O Addition during the Growth of ZnO Films by Chemical Vapor Deposition Using a Catalytic Reaction
(Nagaoka U. Tech.) Tajima Ryouichi, Watanabe Koudai, Ono Shotarou, Kato Takahiro, *Yasui Kanji
chemical vapor deposition
catalytic reactions
ZnO films
K-2112
17:00～ 17:20E225[Requested talk] Engineering Carbon Nanotube Synthesis: Catalyst Screening, Identification of Reactive Species, and Rational Reactor Design
(Waseda U.) (Ful)Noda Suguru
carbon nanotubes
chemical vapor deposition
rational design and development
K-219

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化学工学会 第82年会 (東京 2017)

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