Hall E, Day 2 - Hall and day program - SCEJ 82nd Annual Meeting (Tokyo, 2017)

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`SCEJ 82nd Annual Meeting (Tokyo, 2017)`

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Hall and day program : Hall E, Day 2

The abstracts can be viewed by clicking the Paper IDs.
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Hall E(Kyoshitsu-to 4F 404), Day 2(Mar. 7)

K-2

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
K-2 [International Symposium] Reaction Engineering of CVD: iCVD and Emerging Processes, Applications, and Fundamental Understanding
(9:00–12:00) (Chair: Noda Suguru)
9:00– 9:40	E201	[Invited lecture] Analysis and Design of CVD/ALD processes Based on Chemical Reaction Engineering (U. Tokyo) (Ful)Shimogaki Yukihiro	Chemical Reaction Engineering CVD Process Design	K-2	838
9:40– 10:20	E203	[Invited lecture] Cat-CVD and Its Development to Various Fields (JAIST) Matsumura Hideki	Thin Film Technology Cat-CVD Cat-doping	K-2	82
10:20– 10:40	E205	[Requested talk] Reaction Mechanism and Growth-rate Distribution in Metal-Organic Vapor-Phase Epitaxy of GaN (U. Tokyo) *(Ful)Sugiyama Masakazu, (Ful)Momose Takeshi, (Politecnico Di Milano) Ravasio Stefano, Cavallotti Carlo, (U. Tokyo) (Ful)Shimogaki Yukihiro	GaN MOVPE reaction mechanism	K-2	324
10:40– 11:00	E206	[Requested talk] Plasma decomposition of hexamethyldisiloxane, oxygen, and ammonia for coating a polymer substrate with silica-based film (Kyoto U.) (Ful)Kawase M.	Plasma CVD silica-based gas-barrier film HMDSO	K-2	740
11:00– 11:20	E207	[Requested talk] B-atom release from metal wires boronized by non-explosive boron compounds (Shizuoka U.) Umemoto Hironobu	chemical vapor deposition hot wire boron atoms	K-2	17
11:20– 11:40	E208	[Requested talk] Surface reaction design for silicon epitaxial growth based on the reactor simulation (Yokohama Nat. U.) *(Ful)Habuka Hitoshi, Watanabe Toru, Yamada Ayami, Saito Ayumi, Sakurai Ayumi	silicon epitaxial growth rate trichlorosilane silicon hydride	K-2	14
11:40– 12:00	E209	[Requested talk] CVD and ALD precursor candidates for transition metal film deposition (Gas-Phase Growth) Machida Hideaki	Transition metal film Amidinate precursor Ethyl derivatives	K-2	157
(13:00–15:20) (Chair: Momose Takeshi)
13:00– 13:40	E213	[The SCEJ Award for Outstanding Asian Researcher and Engineer] Vapor-phase deposition of functional polymer films and their applications (KAIST) Im Sung Gap	initiated chemical vapor deposition functional polymer films electronic, separation, and biomedical applications	K-2	26
13:40– 14:20	E215	[Invited lecture] Application of Cat-CVD technology to crystalline silicon solar cells (JAIST) *Ohdaira Keisuke, Trinh Cham Thi, Oikawa Takafumi, Seto Junichi, Koyama Koichi, Matsumura Hideki	catalytic chemical vapor deposition crystalline Si solar cell passivation	K-2	85
14:20– 14:40	E217	[Requested talk] Synthesis of carbon nitride using microwave plasma CVD (Gifu U.) *Tanaka Ippei, (Chiba Inst. Tech.) Sakamoto Yukihiro	plasma CVD carbon nitride	K-2	477
14:40– 15:00	E218	[Requested talk] PEALD-TiO₂ films synthesized via CCRF discharges (Tokyo Electron Yamanashi) Iwashita Shinya	TiO2 PEALD deposition	K-2	217
15:00– 15:20	E219	[Requested talk] Surface coating of carbon nanotubes by aerosol process with plasma enhanced chemical vapor deposition (Hiroshima U.) *(Ful)Shimada Manabu, (Ful)Kubo Masaru, (Hiroshima U./ITS Surabaya) (Ful)Kusdianto K.	PECVD carbon nanotube dry coating process	K-2	396
(15:40–17:20) (Chair: Machida Hideaki)
15:40– 16:00	E221	[Requested talk] Novel catalytic property of structured catalyst prepared by wet-type chemical deposition (Shizuoka U.) (Ful)Fukuhara Choji	Electroless plating Structured catalyst Hydrogen production	K-2	198
16:00– 16:20	E222	[Requested talk] Thin film deposition in supercritical fluids - impact of solvent capability on deposition characteristics (U. Yamanashi) (Ful)Kondoh Eiichi	supercritical fluids solvent capability thin film deposition	K-2	184
16:20– 16:40	E223	[Requested talk] Hot-filament CVD growth of low-resistivity diamond for power device applications (AIST) Ohmagari Shinya	hot-filament CVD diamond low-resistivity	K-2	219
16:40– 17:00	E224	[Requested talk] Effects of N₂O Addition during the Growth of ZnO Films by Chemical Vapor Deposition Using a Catalytic Reaction (Nagaoka U. Tech.) Tajima Ryouichi, Watanabe Koudai, Ono Shotarou, Kato Takahiro, *Yasui Kanji	chemical vapor deposition catalytic reactions ZnO films	K-2	112
17:00– 17:20	E225	[Requested talk] Engineering Carbon Nanotube Synthesis: Catalyst Screening, Identification of Reactive Species, and Rational Reactor Design (Waseda U.) (Ful)Noda Suguru	carbon nanotubes chemical vapor deposition rational design and development	K-2	19

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SCEJ 82nd Annual Meeting (Tokyo, 2017)

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