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SCEJ 86th Annual Meeting (2021)

Program search result : 石井 克典 : 7 programs

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Authors and Chairs (J) field exact matches “石井 克典”; 7 programs are found.
The search results are sorted by the start time.

TimePaper
ID		Title / AuthorsKeywordsTopic codeAck.
number
Day 1
13:00– 13:20		J113Control of isopropanol permeation through MOR zeolite membranes
(Shibaura Inst. Tech.) *(Reg)Nomura Mikihiro, Yoshida Yuki, Yamaga Ryuhei, (Stu)Ishii Katsunori
MOR zeolite membranes
Water/Isopropanol
post-treatment
4-a12
Day 1
13:40– 14:00		J115Membrane properties of CVD derived silica membranes prepared by a counter diffusion method using ozone as a reactant
(Shibaura Inst. Tech.) *(Stu)Ishii K., (Reg)Nomura M.
silica membrane
chemical vapor deposition
inorganic membrane
4-a96
Day 2
13:20– 14:20		PC201Investigation of high pressure organic liquid separation membranes by using the adsorption effects
(Shibaura Inst. Tech.) *(Stu)Ota F., (Stu)Yoshiura J., Nakagaki Y., (Stu)Ishii K., (Reg)Nomura M.
Silica membrane
Chemical vapor deposition
Organic liquids
4-a22
Day 2
13:20– 14:20		PC221Development of catalytic assisted CVD silica membranes for a hydrogen permselective membrane reactor
(Shibaura Inst. Tech.) *(Stu)Nagataki Y., (Stu)Nagataki T., (Stu)Yoshiura J., (Stu)Ishii K., (Reg)Nomura M.
CVD silica membrane
Propane dehydrogenation
Membrane reactor
4-a201
Day 2
14:20– 15:20		PC208CO2 permeation through CHA zeolite membranes
(Shibaura Inst. Tech.) *(Stu)Gama da Silva Figueiredo G., (Stu)Takayama D., (Stu)Ishii K., (Reg)Nomura M.
membrane separation
inorganic membrane
CHA zeolite
4-a115
Day 2
14:20– 15:20		PC216Investigation of a ceramic coating method on porous substrates for CVD silica membranes
(Shibaura Inst. Tech.) *(Stu)Saito Yuta, (Stu)Ishii Katsunori, (Reg)Nomura Mikihiro
Silica membrane
Hydrogen permeance
Permeance resistance
4-a130
Day 2
14:20– 15:20		PC226Coating of alumina sol on ceramic substrates for hydrogen separation membranes
(Shibaura Inst. Tech.) *(Stu)Nagataki T., (Stu)Nagataki Y., (Stu)Yoshiura J., (Stu)Ishii K., (Reg)Nomura M.
Silica Membrane
Chemical Vapor Deposition
Intermediate Layer
4-a422

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SCEJ 86th Annual Meeting (2021)

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