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SCEJ 85th Annual Meeting (2020) / / IChES 2020

List of received applications (By topics code)

5) Chemical reaction engineering

5-h. CVD & dry processes

Most recent update: 2020-09-26 15:59:01

The keywords that frequently used
in this topics code.		KeywordsNumber
CVD4*
carbon nanotube3*
chemical vapor deposition2
fluidized bed1

ACKN
No.		Title/Author(s)KeywordsStyle
103Kinetic analysis of TiAlN-CVD process for construction of reaction model (2)
(U. Tokyo) *(Stu)Yamaguchi Jun, Hirabaru Tomoko, (Kyocera) (Cor)Kubo Hayato, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Kyocera) (Cor)Tanibuchi Takahito, (U. Tokyo) (Reg)Shimogaki Yukihiro		CVD
TiAlN
cutting tool
P
222Theoretical study for modeling surface reactions on SiC-CVI process
(U. Tokyo) *(Stu)Sato Noboru, (Stu)Otaka Yuhei, (Stu)Aji Ryosuke, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro		CH3SiCl3
SiC CVI
surface reaction
O
396Feeding metalorganic vapors, supporting catalysts and synthesizing long carbon nanotubes by fluidized bed
(Waseda U.) *(Stu)Tatsukawa Arin, Li Mochen, (Reg)Sugime Hisashi, (Reg)Osawa Toshio, (Reg)Noda Suguru		carbon nanotube
fluidized bed
chemical vapor deposition
P
450Effect of SiCl4 addition for SiC-CVD from MTS/H2
(U. Tokyo) *(Stu)Otaka Yuhei, (Stu)Aji Ryosuke, (Stu)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro		CVD
SiC
Recycle
P
462Time-evolution of film thickness profiles by level set method during CVD multiscale simulation
(U. Tokyo) *(Stu)Zhang Jin, (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro		multiscale simulation
chemical vapor deposition
level set method
O
515Fabrication and hierarchical structure control of carbon nanotube electron field emitter for X-ray tube
(Waseda U.) *(Stu)Yasui Kotaro, Kitagawa Sae, (Reg)Sugime Hisashi, Ochi Hayato, Takahashi Daizo, (Waseda U.) (Reg)Noda Suguru		carbon nanotube
electron field emitter
hierarchical structure control
P
572Effects of dispersant for PECVD process with concurrent use of solid raw material upon synthesized composite thin films
(Hiroshima U.) *(Reg)Shimada Manabu, (PCEF)Takahashi Kazuma, (Reg)Kubo Masaru		titanium dioxide
carbon nanotube
photocatalyst
O
608Residual stress in gas barrier silica film prepared by plasma chemical vapor deposition
(Kyoto U.) *(Reg)Kawase M., (Stu)Hirata S., (Stu·PCEF)Wakisaka T.		CVD
residual stress
silica gas barrier film
O
614Development of methylammonium lead iodide perovskite film CVD process
(Kyoto U.) *(Reg)Kawase M., (Stu)Murakami T., (Stu)Matsuda M.		CVD
methylammonium lead iodide
lead melt
O
List of received applications (By topics code)
List of received applications
SCEJ 85th Annual Meeting (2020)
IChES 2020
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Most recent update: 2020-09-26 15:59:01
For more information contact Organizing Committee, SCEJ 85th Annual Meeting (2020) / / IChES 2020
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