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SCEJ 84th Annual Meeting (Tokyo, 2019)

List of received applications (By topics code)

12) Materials engineering & interfacial phenomena

12-h. Coating technology

Most recent update: 2019-10-02 20:29:01

The keywords that frequently used
in this topics code.		KeywordsNumber
numerical simulation2
oxide semiconductor1

ACKN
No.		Title/Author(s)KeywordsStyle
191Structure control based on the drying characteristics of colloidal suspensions
(U. Tokyo) *(Reg)Tatsumi R., (PIA) (Reg)Koike O., (Reg)Yamaguchi Y., (U. Tokyo) (Reg)Tsuji Y.		Colloidal suspension
Drying characteristics
Numerical simulation
O
1099Numerical simulation of effects of solvent and modifier on structure formation of surface-modified nanoparticles during solvent evaporation
(Tohoku U.) *(Stu·PCEF)Usune Shin, (Stu·PCEF)Takahashi Tarou, (Reg)Kubo Masaki, (Reg)Shoji Eita, (Reg)Tsukada Takao, (PIA) (Reg)Koike Osamu, (U. Tokyo) (Reg)Tatsumi Rei, (Josai U.) (Reg)Fujita Masahiro, (Tohoku U.) (Reg)Adschiri Tadafumi		numerical simulation
surface-modified nanoparticles
structure formation
O
1386Preparation of Li-doped NiO semiconductor thin films deposited by ultrasonic spray deposition
(U. Tokyo) *(Stu)Miyazaki Mai, (Reg)Sakai Enju, (Stu)Tanaka Kento, (Reg)Tatsumi Rei, (Reg)Tsuji Yoshiko		ultrasonic spray deposition
Li-doped NiO
oxide semiconductor
P
List of received applications (By topics code)
List of received applications
SCEJ 84th Annual Meeting (Tokyo, 2019)
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Most recent update: 2019-10-02 20:29:01
For more information contact Organizing Committee, SCEJ 84th Annual Meeting (Tokyo, 2019)
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