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SCEJ 49th Autumn Meeting (Nagoya, 2017)

List of received applications (By topics code)

ST) SCEJ Trans-Division Symposium

ST-26. [Trans-Division Symposium] CVD & Dry Processes -Reaction Engineering for the Structure / Functions Control-

Organizer(s): Shimoyama Yusuke (Tokyo Tech), Nishida Satoshi (Gifu Univ.), Ikeda Kei (ATHENASYS Co.,Ltd.)

CVD and other dry processes are core technology in the industry applications for solar cell, electronics devices, MEMS, and functional coatings. This symposium motivates to discuss the logical optimization and design for controlling the microstructure and functions of thin films and fine particles produced by CVD or other dry processes based on the theoretical understanding of reaction mechanisms. Young Researcher Award will be given to distinguished young speakers chosen at the session.

Most recent update: 2018-02-12 17:39:01

The keywords that frequently used
in this topics code.		KeywordsNumber
CVD5*
chemical vapor deposition4*
plasma CVD2
carbon nanotube2
SiC2
passivation1

ACKN
No.		Title/Author(s)KeywordsStyle
61Flame-synthesis of single-wall carbon nanotubes: control over reaction field, flow field and catalyst supply for their quality
(Waseda U.) *(Stu)Okada Shohei, (Ful)Sugime Hisashi, (Ful)Osawa Toshio, (Fujifilm) (Cor)Sugiura Hiroki, (Cor)Kataoka Shohei, (Cor)Igarashi Tatsuya, (Waseda U.) (Ful)Noda Suguru		single-wall carbon nanotubes
flame synthesis
reaction field control
O
62The role of sulfur for the growth of carbon nanotube in chemical vapor deposition
(Tokyo Tech) *(Stu)Suzuki Shunsuke, (Ful)Mori Shinsuke		carbon nanotube
sulfur
chemical vapor deposition
O
187[Invited lecture] Ultra-high-speed coating of Diamond-Like Carbon by high-density plasma surrounding substrate and source gas blowing toward substrate
(Gifu U.) Kousaka Hiroyuki		Diamond-Like Carbon
Microwave
Plasma CVD
O
367The precursor pressure dependence of the crystal structure of Ti1-xAlxN films by thermal CVD
(U. Tokyo) *(Stu)Sato Hiroki, Hirabaru Tomoko, (Kyocera) (Cor)Kubo Hayato, (U. Tokyo) (Ful)Momose Takeshi, (Kyocera) (Cor)Tanibuchi Takahito, (U. Tokyo) (Ful)Shimogaki Yukihiro		CVD
TiAlN
cutting tool
O
609Rate analysis of carbon CVD on inert surfaces from benzene
(Kyoto U.) *(Stu)Kamimura Shuhei, (Ful)Kawase Motoaki		CVD
Carbon
Benzene
O
618Mass spectrometry of gas phase in plasma CVD of silica films
(Kyoto U.) *(Stu)Tanaka M., (Ful)Kawase M.		plasma CVD
silica
mass spectrometry
O
658Mechanism of fabrication of metal-organic framework HKUST-1 film by spray method
(Hiroshima U.) *(Ful)Kubo Masaru, (Stu)Sugahara Takuya, (Ful)Shimada Manabu		Porous materials
Crystal growth
Carbon nanotube composite
O
666Porous carbon electrode fabricated from supercritical drying for Li-O2/CO2 battery
(Tokyo Tech) *(Stu)Kunanusont N., (Ful)Shimoyama Y.		supercritical drying
porous carbon electrode
Li-O2/CO2 battery
O
681Effect of reaction conditions on morphology of TiO2 layer formed on MWCNT by in-flight coating process
(Hiroshima U.) *(Stu·PCEF)Fukumoto Yoshihiko, (Ful)Kubo Masaru, (Hiroshima U./ITS Surabaya) (Ful)Kusdianto K., (Hiroshima U.) (Ful)Shimada Manabu		Nanocomposite
Plasma-enhanced chemical vapor deposition
Aerosolization
O
711Adhesion strength improvement of TiC-based hard coating layer by surface treated WC-Co
(Osaka Pref. U.) *(Stu)Tanaka Chihiro, (Stu)Kiyokawa Daichi, (Ful)Okamoto Naoki, (Ful)Saito Takeyasu, (Osaka U.) Higuchi Kouji, Kitajima Akira		adhesion strength
hard coating
cemented carbide
O
729Reduction of by-products in exhaust gases of CVD from Si-Cl compounds enabled by additive gases
(U. Tokyo) *(Stu)Sato Noboru, (IHI) (Cor)Fukushima Yasuyuki, (U. Tokyo) (Stu)Funato Yuichi, (Ful)Shima Kohei, (Ful)Momose Takeshi, (NIAD-QE) Koshi Mitsuo, (U. Tokyo) (Ful)Shimogaki Yukihiro		silicon chlorine compounds
by-product
elementary reaction simulation
O
769Effect of carbon monoxide on the growth of multi-walled carbon nanotube by chloride mediated CVD
(Shizuoka U.) *(Stu)Komatsubara K., Yamanashi H., Karita M., Nakano T., Inoue Y., (JNC) (Cor)Nagaoka H.		carbon nanotube
carbon monoxide
chemical vapor deposition
O
770[Review lecture] A control of processes based on advanced plasma sciences and their future prospects
(Nagoya U.) *Hori Masaru, Ishikawa Kenji, Sekine Makoto		Plasma
Deposition
Etching
O
800[Review lecture] Thin film deposition technologies for future high efficiency crystalline Si solar cells
(Toyota Technological Inst.) *Ohshita Yoshio, (Meiji U.) Nakamura Kyotarou, (Toyota Technological Inst.) Lee Hyunju, Kamioka Takefumi		Solar cells
passivation
CVD
O
805[Invited lecture] Numerical simulation of composite materials production by chemical vapor infiltration using computational fluid dynamics coupled with chemical kinetics
(Nagoya U.) (Ful)Norinaga K.		chemical vapor infiltration
composite materials
numerical simulation
O
806[Invited lecture] Development of 4H-SiC bulk single crystal growth by gas-source method
(DENSO) *(Cor)Makino Emi, (Cor)Tokuda Yuichiro, (Cor)Kanda Takahiro, (Cor)Sugiyama Naohiro, (Cor)Kuno Hironari, (CRIEPI) Hoshino Norihiro, Kamata Isaho, Tsuchida Hidekazu, (DENSO) (Cor)Kojima Jun		4H-SiC
gas-source method
fast growth
O
810Investigation of growth model on SiC-CVI process with high precursor concentration
(U. Tokyo) *(Stu)Naka Tomoaki, (Stu)Sato Noboru, (Ful)Shima Kohei, (Stu)Funato Yuichi, (IHI) (Cor)Fukushima Yasuyuki, (U. Tokyo) (Ful)Momose Takeshi, (Ful)Shimogaki Yukihiro		CVI
SiC
process
O
813[Invited lecture] Reaction Engineering on the Supercritical Hydrothermal Synthesis
(Nagoya U.) (Ful)Takami S.		supercritical hydrothermal synthesis
metal oxide nanoparticles
reaction engineering
O
875Synthesis of Carbon Nanowalls by Plasma Enhanced CVD Utilizing ECR Discharge and Investigation of Their Parallelization
(Tokyo Tech) *(Stu)Suzuki Ryo, (Ful)Mori Shinsuke		carbon nanowalls
plasma enhanced CVD
O
883Chirality selective synthesis of carbon nanotubes using binary catalyst optimized by combinatorial method
(Waseda U.) *(Stu)Edo Michiko, (Ful)Sugime Hisashi, (Ful)Noda Suguru		chemical vapor deposition
carbon nanotubes
chirality control
O
923Construction of overall reaction model on SiC-CVD and experimental verification
(U. Tokyo) *(Stu)Funato Yuichi, (Stu)Sato Noboru, (Ful)Shima Kohei, (Stu)Naka Tomoaki, (IHI) (Ful)Fukushima Yasuyuki, (U. Tokyo) (Ful)Momose Takeshi, (Ful)Shimogaki Yukihiro		SiC
CVD
modeling
O
942Multiscale analysis and simulation on trench filling process by chemical vapor deposition
(U. Tokyo) *(Stu)Funato Yuichi, (Stu)Sato Noboru, (Ful)Shima Kohei, (Stu)Naka Tomoaki, (IHI) (Ful)Fukushima Yasuyuki, (U. Tokyo) (Ful)Momose Takeshi, (Ful)Shimogaki Yukihiro		CVD
trench
Multiscale
O
1003Low temperature growth of ultra-high mass density carbon nanotube forests on conductive supports
(Waseda U.) (Ful)Sugime Hisashi		chemical vapor deposition
low temperature growth
lithography
O
List of received applications (By topics code)
List of received applications
SCEJ 49th Autumn Meeting (Nagoya, 2017)
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Most recent update: 2018-02-12 17:39:01
For more information contact Organizing Committee, SCEJ 49th Autumn Meeting (Nagoya, 2017)
E-mail: inquiry-49fwww3.scej.org
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