SCEJ

$B2=3X9)3X2q(B $BBh(B40$B2s=)5(Bg2q(B

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$B:G=*99?7F|;~!'(B2008-09-20 14:26:11
$B9V1i(B
$B;~9o(B		$B9V1i(B
$BHV9f(B		$B9V1iBjL\!?H/I=$B%-!<%o!<%I(B$BJ,N`(B
$BHV9f(B		$B$BHV9f(B
$B%7%s%]%8%&%`(B $B!c#C#V#D!&%I%i%$%W%m%;%9%7%s%]%8%&%`!!!]%J%N!&%^%$%/%m9=B$7A@.%W%m%;%9$NH?1~9)3X!]!d(B
(10:00$B!A(B11:00)$B!!(B($B:BD9(B $BLn:j(B $BCRMN(B)
10:00$B!A(B 10:20T204$B?(G^(BCVD$BK!$K$*$1$kC1AX%+!<%\%s%J%N%A%e!<%V?bD>G[8~@.D9$NA06nBN(B
($BElBg1!9)(B) $B!{(B($B3X(B)$B?yL\(B $B91;V(B$B!&(B($B@5(B)$BLnED(B $BM%(B$B!&(B($B@5(B)$B;38}(B $BM34tIW(B		single-walled carbon nanotubes
chemical vapor deposition
gas phase reaction
S-38277
10:20$B!A(B 10:40T205$B%+!<%\%s%J%N%A%e!<%V9g@.$N$?$a$N5!G=J,C4?(G^$N3+H/(B
($BElBg1!9)(B) $B!{(B($B3X(B)$BLnB<(B $B7KJc(B$B!&(B($B3X(B)$BD9C+@n(B $B3>(B$B!&(B($B@5(B)$BLnED(B $BM%(B$B!&(B($B@5(B)$B;38}(B $BM34tIW(B		carbon nanotube
catalyst
chemical vapor deposition
S-38387
10:40$B!A(B 11:00T206$B%+!<%\%s%J%N%A%e!<%V!&%S%"G[@~$K8~$1$?GvKl?(G^$N3+H/(B
($BElBg1!9)(B) $B!{(B($B3X(B)$BGr0f(B $B@;(B$B!&(B($B@5(B)$BLnED(B $BM%(B$B!&(B($B@5(B)$B;38}(B $BM34tIW(B		Carbon nanotube
S-38460
(11:00$B!A(B12:00)$B!!(B($B:BD9(B $BLnED(B $BM%(B)
11:00$B!A(B 11:20T207$B%1%$AG=$>~%+!<%\%s%J%N%U%!%$%P!<$N@=B$(B
($B5~Bg1!9)(B) $B!{(B($B3X(B)$B5W>>(B $B<#(B$B!&(B($B3X(B)$B1|B<(B $BBsLi(B$B!&(B($B@5(B)$BEDLg(B $BH%(B$B!&(B($BKLBg1!9)(B) ($B@5(B)$B8~0f(B $B?B(B		carbon nanofibers
Liquid pulse injection technique
Si coating
S-38330
11:20$B!A(B 11:40T208$BI=LL=$>~%+!<%\%s%J%N%U%!%$%P!<$N@=B$(B
($B5~Bg1!9)(B) $B!{(B($B3X(B)$BCSED(B $BF;<#(B$B!&(B($B3X(B)$B5W>>(B $B<#(B$B!&(B($B3X(B)$B;38}(B $B>PH~(B$B!&(B($B@5(B)$BEDLg(B $BH%(B$B!&(B($BKLBg1!9)(B) ($B@5(B)$B8~0f(B $B?B(B		carbon nanofibers
Liquid pulse injection technique
surface modification
S-38576
11:40$B!A(B 12:00T209In-situ$B@V30J,8wJ,@O$rMQ$$$?G.J,2rC:AG(BCVD$BH?1~2aDx$N?dDj(B
($B5~Bg9)(B) ($B@5(B)$B2O@%(B $B85L@(B$B!&(B$B!{(B($B3X(B)$B0KF#(B $B7IJ8(B$B!&(B($B@5(B)$B;01:(B $B9'0l(B		pyrocarbon
CVD
infrared absorption
S-38470
(13:00$B!A(B14:00)$B!!(B($B:BD9(B $B2O@%(B $B85L@(B)
13:00$B!A(B 13:20T213$B4pHD>e$NC1AX%+!<%\%s%J%N%A%e!<%V$N9bB.@.D92aDx$K$*$1$kD>7BJQ2=(B
($BElBg1!9)(B) $B!{(B($B3X(B)$BD9C+@n(B $B3>(B$B!&(B($B@5(B)$BLnED(B $BM%(B$B!&(B($B@5(B)$B;38}(B $BM34tIW(B		Single-walled carbon nanotubes
catalytic chemical vapor deposition
growth mechanism
S-38596
13:20$B!A(B 13:40T214$BEE;R%(%_%C%?1~MQ$rL\E*$H$7$?C1AX%+!<%\%s%J%N%A%e!<%V$N7ABV@)8f$H%3%s%S%J%H%j%"%kFC@-I>2A(B
($BElBg1!9)(B) $B!{(B($B@5(B)$BGrD;(B $BMN2p(B$B!&(B($BBgF|K\%9%/%j!<%s@=B$(B) $B8E;T(B $B9M$B!&(B($BElBg1!9)(B) ($B@5(B)$BLnED(B $BM%(B$B!&(B($B@5(B)$BDT(B $B2B;R(B$B!&(B($B3X(B)$B?yL\(B $B91;V(B$B!&(B$BD%(B $B@559(B$B!&(B$B4];3(B $BLPIW(B$B!&(B($B@5(B)$B;38}(B $BM34tIW(B		Single-walled carbon nanotubes
Field emission
Combinatorial evaluation
S-38119
13:40$B!A(B 14:00T215$B<+8JAH?%2=$rMxMQ$7$?C1AX(BCNT$B%U%#!<%k%I%(%_%C%?$N9bL)EY=8@Q(B
($BElBg1!9)(B) $B!{(B($B@5(B)$BLnED(B $BM%(B$B!&(B($BBgF|K\%9%/%j!<%s(B) $B8E;T(B $B9M$B!&(B($BElBg1!9)(B) ($B@5(B)$BGrD;(B $BMN2p(B$B!&(B($B@5(B)$BDT(B $B2B;R(B$B!&(B($B3X(B)$B?yL\(B $B91;V(B$B!&(B($B@5(B)$B;38}(B $BM34tIW(B		field emitter array
single-walled carbon nanotubes
self-organization
S-38112
(14:00$B!A(B15:00)$B!!(B($B:BD9(B $BGrD;(B $BMN2p(B)
14:00$B!A(B 14:20T216$B7V8w%W%m!<%V$rMQ$$$?%^%$%/%mGH$K$h$kH?1~B%?J5!9=$N2rL@(B
($B6bBtBg(B) $B!{(B($B3X(B)$B1JC+(B $B=(B@O:(B$B!&(B$BF#4](B $BFX;K(B$B!&(B$B>.@>(B $B0&(B$B!&(B($B@5(B)$BHf9>Eh(B $BM42p(B$B!&(B($B@5(B)$B9b66(B $B7{;J(B		microwave
fluorescence
S-38311
14:20$B!A(B 14:40T217$B;0%U%C2=1vAG%,%9$K$h$k(B4H-SiC$B%(%C%A%s%0B.EY2r@O(B
($B2#9qBg1!9)(B) $B;01:(B $BK-(B$B!&(B$B>!8+(B $BM:2p(B$B!&(B$BEDCf(B $B7C;R(B$B!&(B$B!{(B($B@5(B)$B1)?<(B $BEy(B$B!&(B($B4XElEE2=(B) $B9b(B $B86(B$B!&(B$B?<9>(B $B8yLi(B$B!&(B($B;:Am8&(B) $B2CF#(B $BCR5W(B$B!&(B$B1|B<(B $B85(B$B!&(B$B9S0f(B $BOBM:(B		SiC
ClF3
Etching
S-3814
14:40$B!A(B 15:00T218$B0[J}@-!&EyJ}@-$rAH$_9g$o$;$?%7%j%3%s?<7!$j%(%C%A%s%0$N7A>u$X$N%"%9%Z%/%HHf$N8z2L(B
($BElBg1!9)(B) $B!{(B($BIt(B)$B5WJ]ED(B $B2mB'(B$B!&(B$B;0ED(B $B5HO:(B$B!&(B($B@5(B)$B?y;3(B $B@5OB(B		Deep RIE
Silicon
Topography
S-38542
(15:00$B!A(B16:00)$B!!(B($B:BD9(B $BsnF#(B $B>f{J(B)
15:00$B!A(B 15:20T219$B7A>u%7%_%e%l!<%7%g%s$K$h$k(BSi$B?<7!$j(BRIE$B$N%b%G%j%s%0(B
($BEl0;V(B$B!&(B($B@5(B)$B6LCV(B $BD>		topography simulation
silicon
RIE
S-38194
15:20$B!A(B 15:40T220$B%9%Q%C%?K!$K$h$k(BFePt$B<'@-BN%J%N%m%C%I$N9=B$!&<'5$FC@-@)8f(B
($BElBg1!9)(B) $B!{(B($B@5(B)$BDT(B $B2B;R(B$B!&(B($B@5(B)$BLnED(B $BM%(B$B!&(B($B@5(B)$B;38}(B $BM34tIW(B		magnetic nanorod
local epitaxy
sputter deposition
S-3864
15:40$B!A(B 16:00T221$B%^%$%/%mG.%W%i%:%^$rMQ$$$?(BSiO2$B5Z$S(BTiO2$B9=B$BN$N7A@.(B
($B;37ABg1!M}9)(B) $B!{(B($B3X(B)$B:XF#(B $BM4Je(B$B!&(B($B@5(B)$BPrED(B $BCi90(B		plasma
S-38681
$B9V1i%W%m%0%i%`(B
$B2=3X9)3X2q(B $BBh(B40$B2s=)5(Bg2q(B
(C) 2008 ($B
Most recent update: 2008-09-20 14:26:11
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